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LING Xu-yu. Characteristics and Electrical Properties of SiNx: H Films Fabricated by Plasma-Enhanced Chemical Vapor Deposition[J]. Journal of Electronic Science and Technology, 2005, 3(3): 264-267.
Citation: LING Xu-yu. Characteristics and Electrical Properties of SiNx: H Films Fabricated by Plasma-Enhanced Chemical Vapor Deposition[J]. Journal of Electronic Science and Technology, 2005, 3(3): 264-267.
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Characteristics and Electrical Properties of SiNx: H Films Fabricated by Plasma-Enhanced Chemical Vapor Deposition

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